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(Funded by the National Institute of Standards and Technology, the National Science Foundation, the U.S. Department of Energy, and the National Aeronautics and Space Administration)
Engineers from Columbia University, the National Institute of Standards and Technology, the University of Montreal in Canada, and the National Institute for Materials Science in Tsukuba, Japan, have shown that an oxygen-free chemical vapor deposition (CVD) method can create high-quality graphene samples at scale. Their work directly demonstrates how trace oxygen affects the growth rate of graphene and, for the first time, identifies the link between oxygen and graphene quality. "We show that eliminating virtually all oxygen from the growth process is the key to achieving reproducible, high-quality CVD graphene synthesis," said James Hone, one of the scientists involved in this study.
