Machine learning model may perfect 3-D nanoprinting

Two-photon lithography is a widely used 3-D nanoprinting technique that can print nanoscale features at very high resolution by focusing an intense beam of light on a precise spot within a liquid photopolymer material. Scientists at Lawrence Livermore National Laboratory and collaborators have turned to machine learning to address two key barriers to industrialization of two-photon lithography: monitoring of parts’ quality during printing and determining the right light dosage for a given material.