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(Funded by the U.S. Department of Energy)
Scientists at Brookhaven National Laboratory have created “resists”—materials that are used as templates for transferring circuit patterns into device-useful substrates such as silicon – that combine the organic polymer poly(methyl methacrylate), or PMMA, with inorganic aluminum oxide. These “hybrid” organic-inorganic resists enable the patterning of high-resolution silicon nanostructures with a high aspect ratio.
